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NE32484A-T1 Folha de dados(PDF) 1 Page - NEC

Nome de Peças NE32484A-T1
Descrição Electrónicos  ULTRA LOW NOISE PSEUDOMORPHIC HJ FET
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Fabricante Electrônico  NEC [NEC]
Página de início  http://www.nec.com/
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NE32484A-T1 Folha de dados(HTML) 1 Page - NEC

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PART NUMBER
NE32484A
PACKAGE OUTLINE
84AS
SYMBOLS
PARAMETERS AND CONDITIONS
UNITS
MIN
TYP
MAX
NFOPT1
Noise Figure, VDS = 2.0 V, ID = 10 mA,
f = 12 GHz
dB
0.6
0.7
GA1
Associated Gain, VDS = 2.0 V, ID = 10 mA, f = 12 GHz
dB
10.0
11.0
P1dB
Output Power at 1 dB Gain Compression Point, f = 12 GHz
VDS = 2.0 V, IDS = 10 mA
dBm
8.5
VDS = 2.0 V, IDS = 20 mA
dBm
11.0
G1dB
Gain at P1dB, f = 12 GHz
VDS = 2.0 V, IDS = 10 mA
dB
10.0
VDS = 2.0 V, IDS = 20 mA
dB
10.5
IDSS
Saturated Drain Current, VDS = 2.0 V, VGS = 0 V
mA
15
40
70
VP
Pinch-off Voltage, VDS = 2.0 V, IDS = 0.1 mA
V
-2.0
-0.8
-0.2
gm
Transconductance, VDS = 2.0 V, ID = 10 mA
mS
45
60
IGSO
Gate to Source Leakage Current, VGS = -3.0 V, ID = 0 mA
µA
0.5
10.0
RTH (CH-A)
Thermal Resistance (Channel to Ambient)
°C/W
750
RTH (CH-C)
Thermal Resistance (Channel to Case)
°C/W
350
ULTRA LOW NOISE
PSEUDOMORPHIC HJ FET
NE32484A
FEATURES
• VERY LOW NOISE FIGURE:
0.6 dB typical at 12 GHz
• HIGH ASSOCIATED GAIN:
11 dB typical at 12 GHz
•LG = 0.25
µm, WG = 200 µm
• LOW COST METAL/CERAMIC PACKAGE
• TAPE & REEL PACKAGING OPTION AVAILABLE
NOISE FIGURE & ASSOCIATED
GAIN vs. FREQUENCY
VDS = 2 V, IDS = 10 mA
Note:
1. Typical values of noise figures and associated gain are those obtained when 50% of the devices from a large number of lots were individually
measured in a circuit with the input individually tuned to obtain the minimum value. Maximum values are criteria established on the production line
as a "go-no-go" screening tuned for the "generic" type but not for each specimen.
Frequency, f (GHz)
ELECTRICAL CHARACTERISTICS (TA = 25°C)
DESCRIPTION
The NE32484A is a pseudomorphic Hetero-Junction FET that
uses the junction between Si-doped AlGaAs and undoped
InGaAs to create very high mobility electrons. The device
features mushroom shaped TiAl gates for decreased gate
resistance and improved power handling capabilities. The
mushroom gate also results in lower noise figure and high
associated gain. This device is housed in an epoxy-sealed,
metal/ceramic package and is intended for high volume
consumer and industrial applications.
NEC's stringent quality assurance and test procedures as-
sure the highest reliability and performance.
1
10
20
30
1.4
1.2
1
0.8
0.6
0.4
0.2
0
24
21
18
15
12
9
6
3
GA
NF
California Eastern Laboratories


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